article.page.titleprefix Theoretical Modelling of Magnetron Sputtering of Boron Nitride Coating
| dc.contributor.author | Rake, Nakka | |
| dc.contributor.author | Kaftanoğlu, Bilgin | |
| dc.contributor.author | Hacaloğlu, Tuğçe | |
| dc.contributor.author | Aydoğan, Asude | |
| dc.date.accessioned | 2023-12-08T09:09:35Z | |
| dc.date.available | 2023-12-08T09:09:35Z | |
| dc.date.issued | 2023-02 | |
| dc.description | Published by MRS Communications, https://doi.org/10.1557/s43579-022-00293-3, Nakka Rake, Bilgin Kaftanoğlu, Tuğçe Hacaloğlu , Asude Aydoğan, Mechanical engineering department, ATILIM University, Ankara, TURKEY. | |
| dc.description.abstract | The fundamentals of the magnetron sputtering (MS) technique are simple. However, the complex interplay of various physical and chemical sub-processes lies in its simplicity. The direct simulation Monte Carlo (DSMC) method is used to model the MS of the Boron Nitride (BN) coating. The Lorentz force, which is created by an electric field, magnetic field and particle collision, is utilized to model the BN coating. Three distinct bias voltages are used to generate three different BN coating models under the same conditions. The modelling of BN coatings reveals that the deposition rate decreases as the substrate voltage increases. | |
| dc.identifier.citation | http://hdl.handle.net/20.500.14411/1849 | |
| dc.identifier.issn | 2159-6867 | |
| dc.identifier.uri | https://doi.org/10.1557/s43579-022-00293-3 | |
| dc.language.iso | en | |
| dc.publisher | MRS Communications | |
| dc.relation.ispartofseries | 13; 1-7 | |
| dc.subject | Coating, modelling, physical vapour deposition (PVD), sputtering, thin film, crystal growth | |
| dc.title | Theoretical Modelling of Magnetron Sputtering of Boron Nitride Coating | |
| dc.type | Article | |
| dspace.entity.type | Article |